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600 Watt RF Generator, 13.56 MHz Automatic RF Matching Network 2 MFCs for gases (02, Ar) 4-6 inch wafer holder 25 – 4 inch wafer cassette compatible 6” square substrate compatible 6 wafer batch capacity 25%+ wafer and wafer to wafer uniformity Programmable vacuum control valving Pressure set and monitoring Recipe driven calibration and processes – PSWD protected 2 x 120 V AC, 3 Wire, 10A Full GUI and software control – control and monitoring Throughput = 70 + wafer per hour Uptime = 90% + MTBF = 400 hrs+ Photoresist etch rate = 0.1 microns/minute or greater Table top unit EMO

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