This announcement is a brand name or equal request for quotes and any quotes received must meet the specifications listed below for direct exposure two photon laser lithography system for three dimensional patterning with resolution of 140nm or better. The government has a requirement for a true 3D micro- and nanostructuring of photosensitive media, e.g. organic photoresists (like SU-8, IP-L, IP-G), hybrid materials (ormocere) or the amorphous semiconductor As2S3 - materials which are capable of 2-photon polymerization/exposure allowing for three dimensional arbitrary patterns to be written into single thick layers of resist. Other specifications include: Patterning of a 250 micron cubic volume at maximum resolution is required and large area patterns composed of overlaid volumes over a minimum area of 10cm^2. Patterning at 780nm with a supplied laser system is required based on compatibility with intended resist systems in addition to those provided with the system, as well as, the possibility of adding a second outboard exposure laser. Objectives required for patterning are both an oil immersion (na=1.4) for patterning at maximum resolution and air (na=0.75) for patterning over large areas and rapid scanning. An additional key aspect of this requirement is the drive control and interface that allows for non-skilled users to operate the system, design/render structures for patterning, control instrument exposure parameters, script instrument operation for batch and large area processing. Sample holders for 1" and 2" diameter samples, 5" square samples, 3"x1" (standard microscope slide) samples and 1.5"x1" (half of a standard microscope slide) should be provided with multiple samples per holder where possible. A highly automated instrument control system is required, including automated registration, focus control and interface identification. An imaging camera is required to allow for in-situ observation of exposures. In order to be compatible with the intended laboratory conditions an enclosed "maintenance free system" with class I laser operation, isolation table and remote instrument control system are required. Furthermore, this system should provide liquid resists, positive and negative as well as proven compatibility with semiconductor, commercial resists like SU-8 and ormosils to further seal it. This solicitation is a request for quotations. All quotations shall indicate how produce proposed meets the specifications above in order to be considered. Pricing for shipping must be included and clearly stated in the quote. This RFQ is issued under simplified acquisition procedures. The size standard for this effort is 500 employees. NAICS 334516. FOB: destination. Payment Terms Net 30 days: Evaluation of Award will be based on overall Best Value to the Government.
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