This Request for a Proposal specifies the design, manufacture, test, delivery, and installation of the Double Multilayer Monochromator (DMM) System.  The DMM system is expected to operate 24/6 for ~ 5,000 hours per year.  Scope includes:  

1. A stage for the up-reflecting multilayer (UML) with cooling system, multilayer mounting, a water-cooled mask, alignment motions, travel motions, and travel limits
2. A stage for the down reflecting multilayer (DML) with cooling system, multilayer mounting, alignment motions, travel motions, and travel limits
3. A monochromatic beam slit (MBS) assembly upstream of the DML.  The blade faces are to be flat.

       Note: Slit mechanism must not conflict with the canted beam path for the
       11-ID-B and 11-ID-C beamlines.

     4  .One vacuum chamber containing the UML with feedthroughs, and additional ports for later add-ons

     5.  One vacuum chamber containing the DML with feedthroughs, larger port for quick access, one port downstream of the

          DML for a beam monitor, and additional ports for later add-ons

         The monochromatic beam scattered by the monochromator of 11-ID-C must pass through the chamber and exit the

         chamber through a window at its downstream end. The monochromatic beam scattered by the 

monochromator of 11-ID-B must pass outside of the chamber, clearing the chamber by at least 75 mm.

      6.  Two support structures for the vacuum chambers.