State Bid

Last Updated on 08 Oct 2021 at 5 AM
RFP
Oregon

PECVD or ICP-CVD

Solicitation ID PCS# 110400-00650-RFP
Posted Date Not Specified
Archive Date Not Specified
NAICS Category
Product Service Code
Set Aside No Set-Aside Used
Contracting Office Not Specified
Agency University Of Oregon
Location Oregon United states
Point Of Contact Not Available
The University of Oregon, on behalf of Knight Campus for Accelerating Scientific (University), is issuing this RFP for the procurement is interested in purchasing a Deep Reactive Ion Etcher, “BOSCH” style system. The tool will be the etch tool for Silicon substrates and will also serve as our primary plasma etch system. The University also wishes to procure an Plasma Enhanced Chemical Vapor deposition system (PECVD) and/or a Inductively Coupled Plasma Chemical Vapor Deposition system (ICP-CVD) for our plasma based deposition needs. See attached document for details.
Bid Protests Not Available