16pc - Substrate:
Fused silica | plane | Ø=25.0(-0.1)mm | t=3.05(±0.10)mm | //<5min
S1: Øe21 | 3/0.2(0.2) [L/10] | 5/1x0.025; L1x0.004 | chamfer 0.2
S2: Øe21 | 3/0.2(0.2) [L/10] | 5/1x0.025; L1x0.004 | chamfer 0.2

1 - Sputter coating run:
HRs,p(22.5°,1560nm)>99.9% + Rs,p(22.5,976nm)<3%
on the front side (S2) of
max. 8 substrates from item 11 (Ø=25.0mm)

1 - Sputter coating run:
ARs,p(22.5°,976nm)<0.5%
on the rear side (S1) of
max. 8 substrates from item 11 (Ø=25.0mm)
(front side coated in item 20)

1- Sputter coating run:
HRs,p(22.5°,1560nm)>99.9% + Rs,p(22.5,1480nm)<3%
on the front side (S2) of
max. 8 substrates from item 11 (Ø=25.0mm)

1- Sputter coating run:
ARs,p(22.5°,1480nm)<0.5%
on the rear side (S1) of
max. 8 substrates from item 11 (Ø=25.0mm)
(front side coated in item 40)